科创中国

Effect of DC magnetron sputtering process on optical and electrical properties of ITO thin films

• 摘要：

  The indium tin oxide (ITO) thin films were deposited on glass substrates in DC magnetron sputtering system. The effects of post-annealing versus in-situ heating, substrate temperatures and DC power on the structural, morphological, electrical and optical properties of ITO thin films were investigated by X-ray diffraction scanning electronic microscopy, UV-Vis spectrophotometry and Hall effect analysis, respectively. The results show that the better electrical and optical properties of the ITO film prepared in situ at a substrate temperature of 410℃ are obtained, compared to the sample prepared at room temperature and annealed in air at 410℃. The resistivity of the ITO films monotonically decreases and the cut-off wavelength exhibits an obvious blue shift. The optimum electrical and optical properties of ITO films deposited are achieved when the substrate temperature and sputtering power is 580℃ and 85 W. The ITO thin films with a minimum resistivity of 1.4×10^-4 Ω·cm and a maximum mean visible transmittance of 93% can be prepared under the optimized process condition.

• 作者：

  寿 彭;Jiwen Jiang;Gang Li;Kuanxiang Zhang;Yong Yang;Tingting Yao;Kewu Jin;Xin Cao;Genbao Xu;Yun Wang

• 刊名：

  Kuei Suan Jen Hsueh Pao/ Journal of the Chinese Ceramic Society

• 在线出版时间：

  2016-7-1